Island Growth in Electrodeposition

Peter M. Hoffmann; Lian Guo; Gerko Oskam; Aleksandar Radisic; Peter C. Searson

doi:10.1016/j.electacta.2010.02.038

Island Growth in Electrodeposition

Peter M. Hoffmann, Lian Guo, Gerko Oskam, Aleksandar Radisic, Peter C. Searson

Research output: Contribution to journal › Article › peer-review

Abstract

Electrochemical deposition of metals onto foreign substrates usually occurs through Volmer–Weber island growth. The mechanism of island nucleation and growth dictates the shape, orientation and number density of islands, and ultimately, the structure and properties of thin films. With increasing emphasis on deposition of ultrathin films and nanostructures, it is critically important to understand the kinetics of nucleation and growth. Here we provide a comprehensive review of island growth in electrodeposition and summarize methods for mechanistic analysis in both the kinetic and diffusion limited regimes.

Original language	American English
Journal	Journal of Physics D: Applied Physics
DOIs	https://doi.org/10.1016/j.electacta.2010.02.038
State	Published - 2011

Disciplines

Physics

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@article{22408183d2d54c54839243df1e5137cb,

title = "Island Growth in Electrodeposition",

abstract = " Electrochemical deposition of metals onto foreign substrates usually occurs through Volmer–Weber island growth. The mechanism of island nucleation and growth dictates the shape, orientation and number density of islands, and ultimately, the structure and properties of thin films. With increasing emphasis on deposition of ultrathin films and nanostructures, it is critically important to understand the kinetics of nucleation and growth. Here we provide a comprehensive review of island growth in electrodeposition and summarize methods for mechanistic analysis in both the kinetic and diffusion limited regimes. ",

author = "Hoffmann, {Peter M.} and Lian Guo and Gerko Oskam and Aleksandar Radisic and Searson, {Peter C.}",

year = "2011",

doi = "10.1016/j.electacta.2010.02.038",

language = "American English",

journal = "Journal of Physics D: Applied Physics",

issn = "1361-6463",

}

TY - JOUR

T1 - Island Growth in Electrodeposition

AU - Hoffmann, Peter M.

AU - Guo, Lian

AU - Oskam, Gerko

AU - Radisic, Aleksandar

AU - Searson, Peter C.

PY - 2011

Y1 - 2011

N2 - Electrochemical deposition of metals onto foreign substrates usually occurs through Volmer–Weber island growth. The mechanism of island nucleation and growth dictates the shape, orientation and number density of islands, and ultimately, the structure and properties of thin films. With increasing emphasis on deposition of ultrathin films and nanostructures, it is critically important to understand the kinetics of nucleation and growth. Here we provide a comprehensive review of island growth in electrodeposition and summarize methods for mechanistic analysis in both the kinetic and diffusion limited regimes.

AB - Electrochemical deposition of metals onto foreign substrates usually occurs through Volmer–Weber island growth. The mechanism of island nucleation and growth dictates the shape, orientation and number density of islands, and ultimately, the structure and properties of thin films. With increasing emphasis on deposition of ultrathin films and nanostructures, it is critically important to understand the kinetics of nucleation and growth. Here we provide a comprehensive review of island growth in electrodeposition and summarize methods for mechanistic analysis in both the kinetic and diffusion limited regimes.

UR - https://iopscience.iop.org/article/10.1088/0022-3727/44/44/443001

U2 - 10.1016/j.electacta.2010.02.038

DO - 10.1016/j.electacta.2010.02.038

M3 - Article

SN - 1361-6463

JO - Journal of Physics D: Applied Physics

JF - Journal of Physics D: Applied Physics

ER -

Island Growth in Electrodeposition

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