New advances and steam laser cleaning of opaque and transparent critical substrates: With IR-lasers to new laser cleaning mechanism

Shishir Shukla, Sergey Kudryashov, Kevin Lyon, Susan D. Allen

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Original languageEnglish
Title of host publicationPhoton Processing in Microelectronics and Photonics V
DOIs
StatePublished - 2006
Externally publishedYes
EventPhoton Processing in Microelectronics and Photonics V - San Jose, CA, United States
Duration: Jan 23 2006Jan 26 2006

Publication series

NameProceedings of SPIE - The International Society for Optical Engineering
Volume6106
ISSN (Print)0277-786X

Conference

ConferencePhoton Processing in Microelectronics and Photonics V
Country/TerritoryUnited States
CitySan Jose, CA
Period1/23/061/26/06

ASJC Scopus Subject Areas

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Computer Science Applications
  • Applied Mathematics
  • Electrical and Electronic Engineering

Keywords

  • Cleaning mechanisms
  • De-ionized water
  • Dry and steam laser cleaning
  • Isopropyl alcohol
  • Nanosecond CO laser
  • Opaque and transparent critical substrates
  • Sub-micron and micron sized particles
  • Time-resolved optical microscopy

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