New infrared stereolithography: Control of the parameters of the localized curing thermosensitive materials

Marco A.F. Scarparo; Andre L.J. Munhoz; Gilson Marinho; Djalma S. Salles; Susan D. Allen

doi:10.1117/12.387564

New infrared stereolithography: Control of the parameters of the localized curing thermosensitive materials

Marco A.F. Scarparo, Andre L.J. Munhoz, Gilson Marinho, Djalma S. Salles, Susan D. Allen

Lab. of Laser Appl. to Fine Mech.

Research output: Contribution to journal › Conference article › peer-review

Original language	English
Pages (from-to)	396-403
Number of pages	8
Journal	Proceedings of SPIE - The International Society for Optical Engineering
Volume	3933
DOIs	https://doi.org/10.1117/12.387564
State	Published - 2000
Externally published	Yes
Event	Laser Applications in Microelectronic and Optoelectronic Manufacturing V - San Jose, CA, USA Duration: Jan 24 2000 → Jan 26 2000

ASJC Scopus Subject Areas

Electronic, Optical and Magnetic Materials
Condensed Matter Physics
Computer Science Applications
Applied Mathematics
Electrical and Electronic Engineering

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10.1117/12.387564

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@article{44f5da3a299a4073bf5f73cad8a6bd91,

title = "New infrared stereolithography: Control of the parameters of the localized curing thermosensitive materials",

author = "Scarparo, {Marco A.F.} and Munhoz, {Andre L.J.} and Gilson Marinho and Salles, {Djalma S.} and Allen, {Susan D.}",

year = "2000",

doi = "10.1117/12.387564",

language = "English",

volume = "3933",

pages = "396--403",

journal = "Proceedings of SPIE - The International Society for Optical Engineering",

issn = "0277-786X",

note = "Laser Applications in Microelectronic and Optoelectronic Manufacturing V ; Conference date: 24-01-2000 Through 26-01-2000",

}

TY - JOUR

T1 - New infrared stereolithography

T2 - Laser Applications in Microelectronic and Optoelectronic Manufacturing V

AU - Scarparo, Marco A.F.

AU - Munhoz, Andre L.J.

AU - Marinho, Gilson

AU - Salles, Djalma S.

AU - Allen, Susan D.

PY - 2000

Y1 - 2000

UR - http://www.scopus.com/inward/record.url?scp=0033715652&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=0033715652&partnerID=8YFLogxK

U2 - 10.1117/12.387564

DO - 10.1117/12.387564

M3 - Conference article

AN - SCOPUS:0033715652

SN - 0277-786X

VL - 3933

SP - 396

EP - 403

JO - Proceedings of SPIE - The International Society for Optical Engineering

JF - Proceedings of SPIE - The International Society for Optical Engineering

Y2 - 24 January 2000 through 26 January 2000

ER -

New infrared stereolithography: Control of the parameters of the localized curing thermosensitive materials

ASJC Scopus Subject Areas

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