New infrared stereolithography: Control of the parameters of the localized curing thermosensitive materials

  • Marco A.F. Scarparo
  • , Andre L.J. Munhoz
  • , Gilson Marinho
  • , Djalma S. Salles
  • , Susan D. Allen

Research output: Contribution to journalConference articlepeer-review

Original languageEnglish
Pages (from-to)396-403
Number of pages8
JournalProceedings of SPIE - The International Society for Optical Engineering
Volume3933
DOIs
StatePublished - 2000
Externally publishedYes
EventLaser Applications in Microelectronic and Optoelectronic Manufacturing V - San Jose, CA, USA
Duration: Jan 24 2000Jan 26 2000

ASJC Scopus Subject Areas

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Computer Science Applications
  • Applied Mathematics
  • Electrical and Electronic Engineering

Cite this