Nucleation and Growth of Copper on TiN from Pyrophosphate Solution

Peter M. Hoffmann; Aleksandar Radisic; John G. Long; Peter C. Searson

Nucleation and Growth of Copper on TiN from Pyrophosphate Solution

Peter M. Hoffmann, Aleksandar Radisic, John G. Long, Peter C. Searson

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Abstract

<div class="line" id="line-19"> <span style='color: rgb(51, 51, 51); font-family: -apple-system, BlinkMacSystemFont, "Segoe UI", Roboto, "Noto Sans", Ubuntu, "Droid Sans", "Helvetica Neue", sans-serif; font-size: 16px;'> In this paper we report on the electrochemical deposition of copper on TiN from pyrophosphate solution. We show that deposition occurs through the instantaneous nucleation of hemispherical clusters followed by diffusion-limited growth over a wide potential range. In this potential regime, the nucleus density increases exponentially with applied potential. The nucleus densities obtained from atomic force microscopy images are in the range of  </span> <img src="https://cfn-live-content-bucket-iop-org.s3.amazonaws.com/journals/1945-7111/148/1/C41/revision1/jes_148_1_C41ieqn1.jpg?AWSAccessKeyId=AKIAYDKQL6LTV7YY2HIK&Expires=1665680627&Signature=StL3kv8NkdCjSZiuQuOK37r9IP0%3D"/> <span style='color: rgb(51, 51, 51); font-family: -apple-system, BlinkMacSystemFont, "Segoe UI", Roboto, "Noto Sans", Ubuntu, "Droid Sans", "Helvetica Neue", sans-serif; font-size: 16px;'>  about two orders of magnitude larger than the highest nucleus density observed in fluoroborate solutions. Such high nucleus densities are essential in depositing continuous thin films because coalescence occurs at relatively low coverages. The near-neighbor distances follow Poisson distributions indicating that the nuclei are randomly distributed over the surface. </span></div>

Original language	American English
Journal	Journal of the Electrochemical Society
State	Published - 2001

Disciplines

Chemistry

Cite this

@article{99305fe07516430f8171c60099bbd1be,

title = "Nucleation and Growth of Copper on TiN from Pyrophosphate Solution",

abstract = " In this paper we report on the electrochemical deposition of copper on TiN from pyrophosphate solution. We show that deposition occurs through the instantaneous nucleation of hemispherical clusters followed by diffusion-limited growth over a wide potential range. In this potential regime, the nucleus density increases exponentially with applied potential. The nucleus densities obtained from atomic force microscopy images are in the range of   about two orders of magnitude larger than the highest nucleus density observed in fluoroborate solutions. Such high nucleus densities are essential in depositing continuous thin films because coalescence occurs at relatively low coverages. The near-neighbor distances follow Poisson distributions indicating that the nuclei are randomly distributed over the surface. ",

author = "Hoffmann, {Peter M.} and Aleksandar Radisic and Long, {John G.} and Searson, {Peter C.}",

year = "2001",

language = "American English",

journal = "Journal of the Electrochemical Society",

issn = "1945-7111",

}

TY - JOUR

T1 - Nucleation and Growth of Copper on TiN from Pyrophosphate Solution

AU - Hoffmann, Peter M.

AU - Radisic, Aleksandar

AU - Long, John G.

AU - Searson, Peter C.

PY - 2001

Y1 - 2001

N2 - In this paper we report on the electrochemical deposition of copper on TiN from pyrophosphate solution. We show that deposition occurs through the instantaneous nucleation of hemispherical clusters followed by diffusion-limited growth over a wide potential range. In this potential regime, the nucleus density increases exponentially with applied potential. The nucleus densities obtained from atomic force microscopy images are in the range of   about two orders of magnitude larger than the highest nucleus density observed in fluoroborate solutions. Such high nucleus densities are essential in depositing continuous thin films because coalescence occurs at relatively low coverages. The near-neighbor distances follow Poisson distributions indicating that the nuclei are randomly distributed over the surface.

AB - In this paper we report on the electrochemical deposition of copper on TiN from pyrophosphate solution. We show that deposition occurs through the instantaneous nucleation of hemispherical clusters followed by diffusion-limited growth over a wide potential range. In this potential regime, the nucleus density increases exponentially with applied potential. The nucleus densities obtained from atomic force microscopy images are in the range of   about two orders of magnitude larger than the highest nucleus density observed in fluoroborate solutions. Such high nucleus densities are essential in depositing continuous thin films because coalescence occurs at relatively low coverages. The near-neighbor distances follow Poisson distributions indicating that the nuclei are randomly distributed over the surface.

UR - https://iopscience.iop.org/article/10.1149/1.1344539

M3 - Article

SN - 1945-7111

JO - Journal of the Electrochemical Society

JF - Journal of the Electrochemical Society

ER -

Nucleation and Growth of Copper on TiN from Pyrophosphate Solution

Abstract

Disciplines

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