Thermally driven laser chemical processing

J. Y. Lin, K. Imen, K. C. Hsiao, S. D. Allen

Research output: Contribution to journal › Conference article › peer-review

Original language	English
Pages (from-to)	376-382
Number of pages	7
Journal	Proceedings - The Electrochemical Society
Volume	91
Issue number	4
State	Published - 1991
Externally published	Yes
Event	Symposium on Process Physics and Modeling in Semiconductor Technology - Montreal, Que, Can Duration: May 1 1990 → May 1 1990

ASJC Scopus Subject Areas

@article{ded686d7e73d4d299df5946bb040d614,

title = "Thermally driven laser chemical processing",

author = "Lin, {J. Y.} and K. Imen and Hsiao, {K. C.} and Allen, {S. D.}",

year = "1991",

language = "English",

volume = "91",

pages = "376--382",

journal = "Proceedings - The Electrochemical Society",

issn = "0161-6374",

number = "4",

note = "Symposium on Process Physics and Modeling in Semiconductor Technology ; Conference date: 01-05-1990 Through 01-05-1990",

}

TY - JOUR

T1 - Thermally driven laser chemical processing

AU - Lin, J. Y.

AU - Imen, K.

AU - Hsiao, K. C.

AU - Allen, S. D.

PY - 1991

Y1 - 1991

UR - http://www.scopus.com/inward/record.url?scp=0025898291&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=0025898291&partnerID=8YFLogxK

M3 - Conference article

AN - SCOPUS:0025898291

SN - 0161-6374

VL - 91

SP - 376

EP - 382

JO - Proceedings - The Electrochemical Society

JF - Proceedings - The Electrochemical Society

IS - 4

T2 - Symposium on Process Physics and Modeling in Semiconductor Technology

Y2 - 1 May 1990 through 1 May 1990

ER -